• 欢迎来到张金灿课题组!
  • 课题组成立于2024年2月现有博士后2名、研究生13名。依托苏州大学能源学院碳材料与能源技术研究部、能源与材料创新研究院和苏州大学—北京石墨烯研究院协同创新中心等平台，专注于石墨烯等纳米碳材料在绿氢循环中的创新应用研究，并与北京大学、剑桥大学等国内外顶尖学府保持长期紧密的学术合作与交流。团队以绿氢产业中制氢和用氢环节的实际需求为牵引，构建"基础溯源—技术攻坚—材料创制"的系统性研究体系：通过构筑新型多功能石墨烯基微反应池并联用原位表征设备，明晰关键材料的结构与性能需求；进而定向研发高性能烯碳催化剂和蒙烯双极板，最终通过"材料原型开发—器件匹配验证—产业协同量产"的产学研模式，推动新型烯碳材料从实验室走向清洁能源领域的规模化应用。
Welcome to Zhang Group!
  • Our research group was established in February 2024 and currently consists of 2 postdoctoral researchers and 13 graduate students, relying on platforms including the College of Energy, Soochow University and the Soochow University-Beijing Graphene Institute Collaborative Innovation Center. We focus on cutting-edge applications of graphene materials in green hydrogen generation and utilization, aiming to elucidate the precise structural and performance requirements for coatings of metal bipolar plates and electrocatalysts in membrane electrode assemblies.
  • 学术亮点 / Highlights
  • AM: Trace Oxygen-Assisted Synthesis of High-Quality Graphene with Improved Electrical Performance
  • 石墨烯的优异性能在实际应用中常因CVD制备过程中产生的点缺陷和非晶碳污染而大幅受限。现有研究多聚焦于污染去除或缺陷修复的单独问题，但二者的关联机制仍不清晰，也缺乏能同时实现清洁与修复的有效策略。此外，氧在石墨烯生长及缺陷修复中的具体作用长期存在争议，仍有待系统阐明。因此，本研究提出了一种痕量氧辅助的后处理策略，通过精准调控氧气的引入，同步实现石墨烯表面非晶碳污染的高效去除与晶格缺陷的快速修复。研究结合第一性原理计算与系统实验验证，揭示了氧气在蚀刻非晶碳和降低缺陷修复能垒方面的双重作用机制，成功将Stone-Wales缺陷的修复能垒从2.84 eV显著降低至0.36 eV。所制备的石墨烯薄膜展现出接近理想单晶的结构完整性，其二维杨氏模量高达355 N·m-1，断裂强度达1778 nN，电学性能方面更是实现了174.4 ± 31.9Ω·sq-1的低方阻和室温下超15000 cm2·V-1·s-1的载流子迁移率。该工作不仅阐明了氧气在高质量石墨烯合成中的新功能，也为面向高性能电子器件的大规模石墨烯制备提供了一条简单而有效的技术路径。图：痕量氧辅助制备高质量石墨烯薄膜。a)痕量氧刻蚀无定形碳并促进缺陷修复示意图。b)理论计算不同结构的修复能垒，氧气存在时结构转变所需的能量最小。c)未处理（蓝色）与处理后（红色）石墨烯薄膜的力-位移曲线，经过处理后的石墨烯力学性能更强。d)经过处理后石墨烯的方块电阻直方图统计结果。
  • AM: Graphene Liquid Cells for In Situ TEM: Unveiling Nanomaterial Growth and Etching
  • 液体环境中纳米材料的生长与刻蚀过程会显著影响其尺寸、形貌和组成成分，从而决定其性能。为了以原子分辨实时可视化这些过程，原位液相透射电子显微成像技术得到了迅速发展，尤其是石墨烯液体池因其高分辨率、制备简便以及兼容常规透射电镜样品杆等特点，成为了强有力的研究平台。本综述首先总结了构筑石墨烯液体池的关键窗口材料——悬空石墨烯的制备方法，并介绍了多种类型的石墨烯液体池结构，在此基础上系统梳理了石墨烯液体池在揭示纳米材料生长与刻蚀过程中的具体应用。最后，本综述对基于石墨烯液体池研究所面临的机遇与挑战进行了展望，旨在为这一快速发展的研究领域提供全景式理解和最新进展的全面概述。左图：用于透射电子显微镜原位观察纳米材料生长与刻蚀过程的石墨烯液体池的制备、构筑与应用；右图：从六个方面对代表性液体池（LCs）进行的比较分析。蓝色-氮化硅（SiNx）液体池。红色-石墨烯液体池（GLC）。绿色-碳膜液体池。成像分辨率反映了在液相 TEM 成像过程中可实现的空间分辨率。稳定性是指液体池在成像过程中的机械鲁棒性。效率描述了在单次组装中能形成多少个可观测的液体囊泡。多功能性描述了集成外部刺激（例如热、电、机械）的能力。简便性评估了制备的难易程度。兼容性是指液体池所能支持的材料和环境范围。
  • 2D Mater.：CVD graphene with high electrical conductivity: empowering applications
  • 石墨烯是一种独特的材料，具有特殊的结构、卓越的性能和广泛的应用前景。特别是石墨烯优异的导电性，使其在多个领域具有无可比拟的优势。化学气相沉积法(CVD)是批量制备高质量石墨烯的主要方法，人们一直致力于逐步提高石墨烯材料的导电性。从这个角度出发，我们对过去5年来高导电石墨烯的生长、转移和后处理策略进行了全面的分析和讨论。先提出了从单层到多层的大面积石墨烯薄膜，随后我们分析了基于石墨烯的复合材料使传统的金属和非金属材料表现出增强的电学性能。最后，对CVD石墨烯材料实现更高电导率以及开发新应用的未来方向进行了展望。图注：高导电CVD石墨烯及其复合材料的可控制备与应用前景。
  • Clean transfer for high-intactness suspended large single-crystal graphene membranes and liquid cells
  • The atomically thin 2D nature of suspended graphene membranes holds promising in numerous technological applications. In particular, the outstanding transparency to electron beam endows graphene membranes great potential as a candidate for specimen support of transmission electron microscopy (TEM). However, major hurdles remain to be addressed to acquire an ultraclean, high-intactness, and defect-free suspended graphene membrane. Here, a polymer-free clean transfer of sub-centimeter-sized graphene single crystals onto TEM grids to fabricate large-area and high-quality suspended graphene membranes has been achieved. Through the control of interfacial force during the transfer, the intactness of large-area graphene membranes can be as high as 95%, prominently larger than reported values in previous works. Graphene liquid cells are readily prepared by π–π stacking two clean single-crystal graphene TEM grids, in which atomic-scale resolution imaging and temporal evolution of colloid Au nanoparticles are recorded. This facile and scalable production of clean and high-quality suspended graphene membrane is promising toward their wide applications for electron and optical microscopy.
  • New growth frontier: superclean graphene
  • The last 10 years have witnessed significant progress in chemical vapor deposition (CVD) growth of graphene films. However, major hurdles remain in achieving the excellent quality and scalability of CVD graphene needed for industrial production and applications. Early efforts were mainly focused on increasing the single-crystalline domain size, large-area uniformity, growth rate, and controllability of layer thickness and on decreasing the defect concentrations. An important recent advance was the discovery of the inevitable contamination phenomenon of CVD graphene film during high-temperature growth processes and the superclean growth technique, which is closely related to the surface defects and to the peeling-off and transfer quality. Superclean graphene represents a new frontier in CVD graphene research. In this Perspective, we aim to provide comprehensive understanding of the intrinsic growth contamination and the experimental solution of making superclean graphene and to provide an outlook for future commercial production of high-quality CVD graphene films.
  • 新闻动态 / News
  • 研究进展 / Research Progress
  • 友情链接 Links